Soft X-ray/EUV plasma simulation for microscopic metrology

This project aims to explore nonlinear optical phenomena occurring in hot, dense plasmas generated from gas targets using both laser-induced and discharge-produced methods. The research will contribute to fundamental understanding and advancement of plasma-light interaction in extreme conditions, relevant for application of high-resolution microscopy useful for metology, and plasma-based light sources generation. The project will combine literature reviews and simulation work, with a focus on optimizing plasma generation and emission characteristics from gas targets. Type of internship : Master internship Required educational background : Nanoscience & Nanotechnology, Physics Supervising scientist(s) : For further information or for application, please contact Hyun-su Kim ( Hyun-su.Kim@imec.be ) The reference code for this position is 2026-INT-100 . Mention this reference code in your application. Only for self-supporting students. Applications should include the following information: resume motivation current study Incomplete applications will not be considered