High-speed UV Nanopatterning for Metasurfaces and Optical Device Fabrication

Description: We focus on the development of nanopatterning processes for electronic device applications using innovative lithographic methods. Multilayer patterning based on advanced optical principles is of particular interest for achieving high-speed, large-area nanofabrication. This work aims to understand material characterization during the lithographic process and the associated light–matter interactions. Process optimization is an integral part of the topic to ensure high-quality pattern formation on samples. During the training period, hands-on experience in lithography as well as metrology for optical characterization will be acquired. Responsibilities: • Prepare samples and receive training in lithographic patterning processes. • Perform optical simulations for lithography. • Support the design and fabrication of metasurfaces. • Document experimental results and contribute to reports and presentations. Type of internship : Master internship, PhD internship Required educational background : Bioscience Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics Supervising scientist(s) : For further information or for application, please contact Hyun-su Kim ( Hyun-su.Kim@imec.be ) The reference code for this position is 2026-INT-079 . Mention this reference code in your application. Only for self-supporting students. Applications should include the following information: resume motivation current study Incomplete applications will not be considered