Design of a MEMS-based plasma sensor to measure ion energy and flux

Plasma processes are widely used in semiconductor manufacturing for etching, deposition and surface modification. The ion energy and ion flux reaching the wafer strongly influence process performance, material damage and device properties. To optimize these processes, sensors are needed that can measure how many ions reach the wafer and with what energy. One widely used approach is the Retarding Field Energy Analyzer (RFEA), a sensor that determines the energy distribution and flux of ions by selectively filtering ions according to their energy before detecting them electrically. Existing substrate-level systems demonstrate the value of this technique, but their architectures are not directly transferable to a compact MEMS device. This creates an opportunity to investigate how the basic RFEA principle can be translated into a first microfabricated sensor design. The objective of this master thesis is to design a miniature MEMS sensor capable of monitoring ion energy and ion flux during semiconductor plasma processing. The student will define the sensor requirements, study the operating principle and develop a feasible device architecture The challenge is to realize a compact MEMS implementation that can accurately characterize ions while remaining compatible with microfabrication constraints. The work will focus on key design parameters such as aperture size, grid spacing, electrode biasing, material selection, alignment and thermal compatibility. Analytical calculations and, where appropriate, limited electrostatic simulations will be used to support the design choices. The proposed device will then be translated into a preliminary layout and fabrication concept compatible with imec's microfabrication capabilities. Fabrication, packaging and full plasma validation are outside the core scope of the thesis and may be considered only as follow-up activities. Imec offers the multidisciplinary environment needed for this design study, combining expertise in MEMS, materials, microfabrication and plasma processing. The student will interact with specialists to understand the measurement needs and fabrication constraints while keeping the project centered on a single, well-defined device concept. This project offers a unique opportunity to combine plasma physics, sensor design and MEMS engineering in a technology area that is critical to advanced semiconductor manufacturing. The main deliverable will be a documented first RFEA design, including its requirements, operating principle, key dimensions, material choices, preliminary layout, expected performance and a proposed route for future fabrication and experimental validation. https:// Type of internship : Master internship Duration : 6 months Required educational background : Chemistry/Chemical Engineering, Computer Science, Electromechanical engineering, Electrotechnics/Electrical Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics Supervising scientist(s) : For further information or for application, please contact Veronique Rochus ( Veronique.Rochus@imec.be ) and Guilherme Brondani Torri ( Guilherme.BrondaniTorri@imec.be ) The reference code for this position is 2026-INT-272 . Mention this reference code in your application. Imec allowance will be provided for students studying at a non-Belgian university. Applications should include the following information: resume motivation current study Incomplete applications will not be considered