Fast and Large Scale Micro-/Nano-lithography for Optical Devices

Background Optical Devices such as diffractive optical elements and nanophotonic devices require precise fabrication of subwavelength structures with high spatial resolution and patterning efficiency. High-speed optical nano-patterning offers a promising approach for rapidly fabricating complex structures while maintaining precise control over the generated patterns. This project aims to investigate and develop a high-speed optical nano-patterning approach for the fabrication of advanced optical devices. The project will combine various idea on lithographic system with combination of material characterization metrology and computational methods. Goal Development of a high-speed nano-patterning approach for metasurface and optical device fabrication. Objectives Develop and configure an optical nano-patterning system. Investigate high-speed pattern generation and exposure methods. Design and generate nanoscale patterns for metasurfaces and optical devices. Characterize the fabricated structures using optical and imaging techniques. Investigate the relationship between patterning parameters and device performance. Explore computational and machine-learning approaches for pattern optimization. Responsibilities may include (to be confirmed): Nano-pattern generation and computational design Experimental fabrication and process optimization Preparation of documentation and support for presentations and publications Expected Outcomes The internship is expected to demonstrate a high-speed nano-patterning workflow and evaluate its potential for metasurface and optical device fabrication. The project will provide practical experience in optical system development, nanofabrication, computational pattern generation, and experimental characterization. Type of internship : Master internship Duration : 6-12 Required educational background : Chemistry/Chemical Engineering, Materials Engineering, Mechanical Engineering, Nanoscience & Nanotechnology, Physics Supervising scientist(s) : For further information or for application, please contact Hyun-su Kim ( Hyun-su.Kim@imec.be ) The reference code for this position is 2026-INT-355 . Mention this reference code in your application. Only for self-supporting students. Applications should include the following information: resume motivation current study Incomplete applications will not be considered