Optimization of SEM Cross-Section Preparation and Inspection

Scanning Electron Microscopy (SEM) is an essential metrology technique in semiconductor manufacturing, enabling high-resolution imaging of device structures and material layers. Both top-view and cross-sectional SEM inspections are widely used to monitor process quality and support technology development. This thesis focuses on developing and optimizing a workflow for SEM cross-section inspections. The student will investigate and optimize the key preparation and inspection steps, including sample capping, cross-section cutting, and SEM imaging. Various imaging parameters such as pixel resolution, dwell time, line integration, and image integration will be evaluated to determine their impact on image quality. Based on experimental results, objective image quality criteria will be defined and used to identify the optimal inspection conditions. The student will also develop standardized pattern and beam templates to establish a robust and uniform methodology for SEM cross-section analysis. This project offers hands-on experience with advanced semiconductor metrology tools and provides an opportunity to contribute directly to the optimization of inspection methods used in a state-of-the-art semiconductor fabrication environment Type of internship : Master internship Duration : 3 months Required educational background : Chemistry/Chemical Engineering, Materials Engineering, Nanoscience & Nanotechnology, Physics Supervising scientist(s) : For further information or for application, please contact Felix Seidel ( Felix.Seidel@imec.be ) The reference code for this position is 2026-INT-341 . Mention this reference code in your application. Only for self-supporting students. Applications should include the following information: resume motivation current study Incomplete applications will not be considered